Generating a Catalytic Mask for the Microrelief of an Optical Element When an Al–Si Structure Is Irradiated by High-Voltage Gas-Discharge Particles

Authored by: Nikolay L. Kazanskiy , Vsevolod A. Kolpakov

Optical Materials

Print publication date:  March  2017
Online publication date:  March  2017

Print ISBN: 9781138197282
eBook ISBN: 9781315279930
Adobe ISBN:

10.1201/b21918-6

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Abstract

DOEs can be fabricated on silicon substrates through plasma-chemical etching. But this technique produces trenches whose profiles and depths deviate from the design intent [236]. Reference 298 proposes a patented technique for fabricating DOE microreliefs that involves coating a substrate with a catalytic mask. Once the mask is deposited, the structure is heated in a carrier gas by using a large-aperture irradiation flux with a wavelength within the transmission window of the material being treated. In this case, the catalytic mask determines the geometry of microrelief trenches.

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