Abstract

Nanofabrication is a complex and expensive process. Especially in semiconductor manufacturing, where the cost of equipment units can reach tens of millions of dollars, and every experiment in process development is costly. Thus, it is no wonder that simulations are used extensively to supplement experiments. Simulations allow engineers and researchers to understand the process, to optimize it by evaluating options, and to correct factors responsible for hindering the process. By troubleshooting process problems and determining optimum process settings, simulations help shorten time and save money by reducing the number of experiments. In addition, if simulators can predict a systematic error, then usually this error can be corrected. We focus on simulation packages that are commercially available, even though there are many good simulators developed in universities and in companies for internal use. A few areas are discussed: optical lithography, electron beam lithography (EBL), nanoimprint, dry etch, film deposition, scanning electron microscope (SEM) metrology, and optical metrology.