Etching

Authored by: Stephen J. Pearton

Encyclopedia of Optical and Photonic Engineering

Print publication date:  September  2015
Online publication date:  September  2015

Print ISBN: 9781439850978
eBook ISBN: 9781351247184
Adobe ISBN:

10.1081/E-EOE2-120038531

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Abstract

Wet and dry etching of semiconductors used in optoelectronics is reviewed. In cases where the active region width is large (>3 µm), wet etching provides a simple, effective method for pattern transfer. For more demanding structures and for a greater degree of control during device fabrication, plasma-etching methods offer advantages.

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